As part of the development of clean energy production chains, the UO is moving towards multi-site offshoring production that will require new energy carriers, such as hydrogen, and systems for conversion and storage. On these topics the UO GREMI brings its expertise in the deposition of thin film by spraying magnetron plasma, a method of non-polluting physical deposition (PVD) well implanted in the industrial environment. These different electrochemical systems are composed of stacking of several layers, some made by other techniques (screen printing, tape casting, etc.). Their performance is highly dependent on the interfaces between each layer of the components; the fine characterisation of its surfaces is therefore particularly important. In order to better control the final properties, it is necessary to study the local characteristics of these surfaces before and after the plasma spray deposition phase(s). This involves the acquisition of an adapted analytical technique, the AFM (Atomic Force Microscopy, EUR 220 000) and an X-ray diffraction device (XRD: X-ray diffraction, EUR 240 000) to obtain structural information on materials of interest, and an oven (EUR 80,000) for annealing. An energy-resolved massspectometer has already been acquired (EUR 113 000) to detect reactive and/or energy species present.