Within the micro and nanotechnology platform of LAAS-CNRS, which is a component of the ReNaTech network, the project involves the commissioning of new advanced laser direct writing equipment; for making masks and reticles for photolithography and direct writing on substrates; necessary for the realization of micro and nano components. The equipment will support any request that it emanates from an academic or an industrialist, French or foreign. Its commissioning will be accompanied by staff dedicated to training users in the design and editing of drawings that themselves generate the pilot files of the equipment. The new equipment will allow both - The rejuvenation of strategic equipment because serving almost all micro- and nano-manufacturing projects - Improving the performance of laser lithography technology - The development of new technological fields in support of scientific research and R&D I - A more eco-responsible approach.