14ACMOS is to explore and realize solutions for 14 Angstrom CMOS chip manufacturing technology, addressing: Lithography, Metrology, Mask Infrastructure and Process Technology. In Lithography the detailed objectives are: - Creating a new generation 0.33NA optical projection system that fits the requirements of the 14A node for power, flow, improved OPO and stable images; Improved functionality. - Achieve 40% improvement in energy efficiency per wafer, by generating a high-efficiency EUV source, as well as improving the scanner's operating efficiency. Improve sustainability by cooling to 32 degrees. - Maximise the lifetime transmission of EUV optics by improving diagnostic capabilities for EUV-induced plasma and its interaction with EUV optical materials. In Metrology, the goal is to achieve a 20% improvement in relevant metrology, characterization and inspection KPIs.